GF40, GF80, GF81 Series Thermal Mass Flow Controllers & Thermal Mass Flow Meters
Designed for solar thin film deposition, CVD, vacuum processes, bioreactors and other industrial gas flow control applications that require cost-efficient solutions.
- Elastomer or metal seal
- Fast sub 1 second settling time
- MultiFlo™ gas and range configurability
- Corrosion-resistant Hastelloy® sensor tube
- Now available up to 300 slpm
GF100 Series Thermal Mass Flow Controllers & Thermal Mass Flow Meters
Designed for semiconductor, MOCVD and other gas flow control applications that require a high-purity, all-metal flow path, the Brooks GF100 Series mass flow controllers deliver outstanding performance, reliability and flexibility. The GF100 Series has been marathon-tested to over three times the semiconductor industry standard for reliability, ensuring repeatable low-drift performance over time.
- Ultra-fast 300-millisecond settling time
- Optional pressure transient insensitive (PTI), high accuracy and safe delivery system models available
- MultiFlo™ gas and range configurability
- Corrosion-resistant Hastelloy® sensor tube and valve orifice (jet)
- Now available up to 300 slpm
GF40/80 Elastomer and Metal Seal Digital Mass Flow Controllers & Mass Flow Meters
Brooks GF40 (elastomer seal) and GF80 (metal seal) thermal mass flow controllers (MFCs) and thermal mass flow meters (MFMs) achieve unprecedented performance, reliability, and flexibility in many gas flow measurement and control applications.
At the heart of the GF40/GF80 is Brooks' patented 4th generation MultiFloTM capable device. MultiFlo overcomes a long-standing limitation of many thermal MFCs – when changing gas types, a simple correction factor, such as the ratio of heat capacities between the calibration gas and new gas, cannot account for accuracy-robbing viscosity and density differences. The Brooks MultiFlo database is built on thousands of native gas runs to establish correction functions that account for both thermal and physical differences among gases making the GF40/GF80 Series among the most accurate and flexible MFCs/MFMs available today.
The Brooks GF40/GF80 Series is the perfect choice for customers who use thermal mass flow controllers or thermal mass flow meters on a variety of gases, who need to change gas type frequently, or who need to re-range while preserving gas measurement and control accuracy. Some examples:
- OEMs will reduce the number of gas- and range-specific MFCs that they inventory
- Solar, biotech, CVD, plasma, glass, web coating, nanotechnology, vacuum processing and similar large users of mass flow meters and mass flow controllers will greatly reduce their gas- and range-specific spares inventory
- R&D, research, and laboratory users can quickly change experiment conditions and achieve much better actual process gas accuracy vs traditional mass flow controllers and mass flow meters
- Now, the GF40/80 Series includes an expanded flow range with the GF81. Featuring an all-metal seal flow path and full scale capacity up to 300 slpm, the GF81 is on a compact footprint enabling simpler installation. Built on a common platform and interface, this Series now enables an entire system to use one product platform.
MultiFlo programming is simple and fast – a new gas and range can be programmed under 60 seconds plus the device can be programmed without removing it from service or disconnecting the device from any process or tool control system.
GF81 High-Flow Metal Seal Digital Mass Flow Controller & Mass Flow Meter
Designed for high-flow applications in thin film, solar, analytical, biotech and fuel cell, the GF81 has all of the features/benefits of the GF40/80, but with extended performance for flow rates up to 300 slpm.
- Smaller footprint than competitive MFCs
- Handles flow rates up to 300 slpm
- Metal seal for durability and high leak integrity
- Precise flow control with fast sub-1 second settling time
- 1% of reading accuracy
- Corrosion-resistant Hastelloy C-22 sensor tube
GF100 Series Ultra-High Purity Metal Seal Thermal Mass Flow Controllers & Thermal Mass Flow Meters
Designed for semiconductor, MOCVD, and other gas flow control applications that require a high purity all-metal flow path, the Brooks GF100 Series mass flow controllers deliver outstanding performance, reliability, and flexibility. Highlights of the GF100 series industry leading features include: ultra fast 300 millisecond settling time, MultiFlo™ gas and range programmability, optional pressure transient insensitivity (PTI), local display, extremely low wetted surface area, and corrosion resistant Hastelloy® sensor tube and valve seat. The GF100 series has been marathon tested to over three times the semiconductor industry standard for reliability, ensuring repeatable low-drift performance over time. An independent diagnostic/service port permits users to troubleshoot or change flow conditions without removing the mass flow controller from service.
MultiFlo™ gas and range programmability, a patented technology developed and refined by Brooks over the last 10 years, has changed the mass flow controller industry by offering customers the ability to select new gas calibrations and full scale ranges without the trouble and cost of removing the mass flow controller from the gas line. The GF100 Series fourth generation MultiFlo technology continues to lead the market with the most accurate and broadest range performance through extensive refinement and physical validation on critical process gases.
Expanded GF100 Series Delivers Higher Flow Rates in Compact Footprint
Three new products have been added to the GF100 Series of mass flow controllers and meters. The GF101, GF121 and GF126 MFCs provide flow rates up to 300 slpm (standard liters per minute) N2 equivalent and are designed explicitly for process applications that include high-flow purge, EPI and blanket gas control.
With its new product extension, Brooks now offers a full range of MFC products specifically intended to help standardize fab-wide and foundry-wide semiconductor and LED processes. This addresses key concerns of many process engineers, such as the need for common, consistent, repeatable performance characteristics across a tool.
By combining Brooks’ proven flow sensor technology with a high speed processor and fast acting diaphragm-free valve assembly, the high flow GF100 Series can boost process productivity as well as help enable fab-wide and foundry-wide controller standardization.
All three new devices feature a compact, space-saving footprint and low power draw that enables the design of smaller, more efficient tools, as well as multiple digital and analog I/O interface options supporting the broadest range of communications protocols, making them an ideal upgrade option to replace older generation mass flow devices. All three devices also feature a rotatable display, which lets users rotate the devices’ readout screen through 180 degrees, so it can be read from any angle, no matter how it is mounted in the tool.
GF101 High Flow Rate High Purity Mass Flow Controllers & Meters
The new GF101 mass flow controller is the high flow rate version of the GF100 and is suited for process steps and tools requiring high purity gas flow control. It delivers high flow rates up to 300 slm N2 equivalent and features an all-metal seal flow path for durability and high leak integrity, stable flow control and fast, sub-1 second settling times to help minimize non-productive tool time.
GF120 (SDS) Ultra-High Purity Safe Delivery System Metal Seal Mass Flow Controller
The GF120 Safe Delivery System (SDS®) is Brooks' state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes. The Brooks GF120 (SDS) models are available in full scale flow ranges 4-25 sccm (option GF120XSL) or >25 sccm to 1 slpm (option GF120XSD). These expensive, hazardous gases are adsorbed onto a solid medium within the gas cylinder, remaining below atmospheric pressure despite containing up to 15 times more dopant than conventional pressurized sources.
GF121 Adds High Flow Rate Option to Ultra-High Purity Mass Flow Controllers & Meters
To expand the options of system designers, the GF121 mass flow controller provides a compact controller for ultra high purity process applications, delivering high flow rates up to 300 slm N2 equivalent. It provides the same compact footprint and all metal seal flow path for durability and high leak integrity as the rest of the GF100 MFC Series.
GF125 (HA) Ultra-High Purity High-Accuracy Metal Seal Mass Flow Controller & Mass Flow Meter
The GF125 High Accuracy (HA) is a gas and range specific model for critical gas process applications requiring the widest working range with tightest flow control accuracy. A typical application is for multi-step processes requiring a high flow rate (up to 10 slpm) and a very accurate low flow rate. Traditionally this has been addressed by using two mass flow controllers. With the GF125 (HA) superior low setpoint accuracy, it is often possible to replace two (a high and low flow) mass flow controllers with one, providing immediate cost savings while freeing up a gas line for greater gas panel flexibility.
The flagship GF125 is a second generation multi-variable, pressure transient insensitive mass flow controller. This product builds upon Brooks' leadership position in pressure transient insensitive (PTI) mass flow controller technology, minimizing process gas flow variation due to pressure and temperature fluctuations. The GF125 enables customers to simplify and reduce the size and cost of gas panels by eliminating the need for point of use pressure regulators, pressure transducers, and associated hardware.
GF126 Ultra-High Purity PTI MFC Adds High Flow Option
The GF126 PTI MFC builds on the innovative efficiency of the GF125 Pressure Transient Insensitive mass flow controller technology. It is a second-generation PTI-MFC that is designed for process applications requiring high flow rates up to 300 slpm N2 equivalent and ultra-high purity in a compact device. The GF126 utilizes a Brooks proprietary control algorithm that inverts the pressure signal, compares it to the pre-fluctuation signal and drives real-time valve position compensation to maintain stable flow, combining the functionality of up to four independent devices (regulator, pressure transducer, temperature sensor, and MFC) into a single, compact, high-performance device.