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Metal Sealed Thermal Mass Flow Controllers & Meters

Highest-purity flow path. Ultra-precise, contaminant-free control.
Many of today’s advanced electronic device fabrication processes require extremely accurate and highly repeatable measurement and control of expensive ultra-pure gases and liquid precursors. Brooks Instrument meets those needs with our game-changing metal sealed thermal mass flow controllers and meters. Precise chemistry control is achieved through the combination of ultra-stable, highly accurate measurement sensors, fast precision control valves and powerful digital electronics. Purity of the process chemistry is ensured by our high-integrity (leak tight), ultra-high purity, all-metal wetted flow path, designed to keep outside contaminants like moisture and oxygen from corrupting the process media. 

Key Applications

  • Silicon semiconductor device fabrication processes – Etch, Strip, CVD, ALD, PVD, Epi, Diffusion, Implant and RTP
  • Compound semiconductor device fabrication processes – MOCVD
  • Precision engineered surface coatings
  • Analytical systems
  • Vacuum processes applications
Select the mass flow device that best serves your process requirements.

PRODUCTS

5850EM Series
5850EM Series
GF80 Series
GF80 Series
GF100 Series
GF100 Series
GF125 Series
GF125 Series
GF135 Series
GF135 Series
Product Type Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller
Differentiator

Large installed base with proven long term performance

High Purity

High Purity/Ultra-High Purity

Standard GF Series

High Flow GF Series

Ultra-High Purity

Ultra-Fast Response Time

Pressure Transient Insensitivity

Real-Time Flow Error Detection

Advanced Diagnostics

Flow Range (Full Scale Capacity) .06 sccm - 30,000 sccm 3 sccm - 300 slm

Standard GF Series: 3 sccm - 55 slm

High Flow GF Series: 51 slm - 300 slm

3 sccm - 300 slm

3 sccm - 5 slm (N2 Eq.)

Seal Material Metal Metal Metal

Metal

Metal

Level of Purity / Surface Finish

316L VAR, 316L, and high alloy ferritic stainless steel

16µ inch Ra 4 - 10µ inch Ra 4 - 5 µ inch Ra 4µ inch Ra
Accuracy

1% F.S. incl. linearity

1.5% F.S. incl. linearity >20 slpm

±1% S.P. 35-100%

±0.35% F.S. < 5-35%

±1% S.P. > 35-100%

±0.35% F.S. 2-35%

±1% S.P. > 35-100%

±0.35% F. S. 2-35%

±1% S.P. 10-100% F.S.

±1% S.P. plus ±0.04% F.S. 2-10% F.S.

Repeatability

0.2% of rate

< ±0.2% S.P. < ±0.15% S.P. < ±0.15% S.P. < ±0.15% S.P.
Response Time

Normally Closed Valve: <3 sec

Optional: 600 msec

Normally Closed Valve: <1 sec

Normally Closed Valve: 700 ms - < 1 sec

SDS Gas Delivery: < 3 sec

300ms - < 1 sec

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

Pressure Transient Insensitivity

<5% S.P. for up to 5 psi/sec upstream press. spike

< 1% S.P. for up to 5 psi/sec upstream press. spike

Multi-Gas & Range Configurability

MultiFlo™ Available MultiFlo™ Standard (most models) MultiFlo™ Standard (most models)

Diagnostic Capability

Available

Available

Available

Available

Analog Communication

4-20 mA

0-5 Vdc

0-20 mA

4-20 mA

0-5 Vdc

0-10 Vdc

0-5 Vdc

0-5 Vdc

0-5 Vdc

Digital Communication

DeviceNet™ 

Profibus®

RS485 S-Protocol

RS485 L-Protocol

RS485 A-Protocol (GF081)

DeviceNet™

RS485 L-Protocol

DeviceNet™

RS485 L-Protocol

DeviceNet™

RS485

Price $$$ $$$ $$$$ $$$$ $$$$$