Tech article highlights the advantages of a new Brooks Instrument pressure-insensitive, pressure-based MFC designed specifically for semiconductor manufacturing.
Dr. Mohamed Saleem, CTO at Brooks Instrument, authored a white paper published in a recent edition of Semiconductor Digest.
HATFIELD, Pa. (USA) January 1, 2022 - Semiconductor Digest magazine, a leading trade magazine covering processes and materials used in semiconductor manufacturing, recently featured a Brooks Instrument technical article discussing a new kind of mass flow controller for the semiconductor industry.
Appearing in the December 2021 issue, the article “Technology Innovations in Pressure-Based Mass Flow Control Adds Versatility for Advanced Semiconductor Processing,” by Dr. Mohamed Saleem, Chief Technology Officer at Brooks Instrument, highlights the company’s new GP200 Series pressure-insensitive, pressure-based mass flow controller (P-MFC). The GP200 is designed specifically for etch and chemical vapor deposition (CVD) processes in semiconductor manufacturing.
Mass flow controllers (MFCs) are the most important component in the gas delivery systems used to produce silicon wafers. MFCs must precisely deliver inert, corrosive and reactive gases to the process chamber, even when operating at very low vapor pressures.
The GP200 Series P-MFC operates well in high-vacuum conditions and above atmospheric pressure conditions that are intrinsic to etch and CVD processes. In comparison, conventional discrete P-MFCs can operate under high-vacuum conditions but degrade in performance and control range as the outlet pressures increase. By offering a greater operating range than conventional P-MFCs, the GP200 Series can improve etch process performance and expand the application scope to include CVD processes.
“Historically, thermal MFCs have been used more in semiconductor manufacturing gas delivery systems; however, pressure-based MFCs are growing in popularity, as they provide significant advantages,” said Saleem. “We specifically designed our pressure-insensitive GP200 Series to optimize etch and CVD processes with highly precise, repeatable gas delivery.”
Because the GP200 Series supports such a broad range of process conditions, it can be used as a drop-in replacement and upgrade for many traditional P-MFCs and thermal MFCs.
To read the full article from Semiconductor Digest, click here.
To watch an interview with Dr. Saleem and Pete Singer, Co-Founder and Editor-in-Chief at Semiconductor Digest, click here: Part 1 and Part 2.
You can also visit experience.brooksinstrument.com/pressure-based-mass-flow-controller-gp200 to access a data sheet, explanatory videos and a white paper detailing how the GP200 Series improves accuracy and repeatability compared to discrete pressure sensors.
About Brooks Instrument:
Since 1946, Brooks Instrument has been a leader in precision fluid measurement and control technology. Providing instrumentation for flow, pressure and vapor delivery, the company serves customers in the semiconductor, pharmaceutical and biopharmaceutical, fiber optics, thin film manufacturing, solar cells, LED, alternative energy, oil and gas, chemical and petrochemical industries. With manufacturing, sales and service locations in the Americas, Europe and Asia, Brooks Instrument has the world’s largest installed base of mass flow controllers. Its broad family of products includes brands such as UNIT Instruments, Tylan, Key Instruments and Celerity. For more information, please visit www.BrooksInstrument.com. The company is also on LinkedIn (www.linkedin.com/company/Brooks-Instrument) and YouTube (www.youtube.com/user/Brooks407).