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Products Mass Flow Controllers Metal Sealed
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Metal Sealed Thermal & Pressure-based Gas Mass Flow Controllers & Meters

Highest-purity flow path. Ultra-precise, contaminant-free control.
Many of today’s advanced electronic device fabrication processes require extremely accurate and highly repeatable measurement and control of expensive ultra-pure gases and liquid precursors. Brooks Instrument meets those needs with our game-changing metal sealed thermal and pressure-based mass flow controllers and meters. Precise chemistry control is achieved through the combination of ultra-stable, highly accurate measurement sensors, fast precision control valves and powerful digital electronics. Purity of the process chemistry is ensured by our high-integrity (leak tight), ultra-high purity, all-metal wetted flow path, designed to keep outside contaminants like moisture and oxygen from corrupting the process media. 

Key Applications

  • Silicon semiconductor device fabrication processes – Etch, Strip, CVD, ALD, PVD, Epi, Diffusion, Implant and RTP
  • Compound semiconductor device fabrication processes – MOCVD
  • Precision engineered surface coatings
  • Analytical systems
  • Vacuum processes applications
Select the mass flow device that best serves your process requirements.

PRODUCTS

GP200 Series
GP200 Series
GF100 Series EtherCAT
GF100 Series EtherCAT
GF100 Series
GF100 Series
GF80 Series
GF80 Series
5850EM Series
5850EM Series
Product Type

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

 Mass Flow Controller
Differentiator

Fully Pressure Insensitive P-MFC

Most Precise Process Gas Delivery Over the Widest Range of Operating Conditions

EtherCAT Communication

High Purity/Ultra-High Purity

Embedded Diagnostics

Ultra-stable Flow Sensor

Improved Valve Shutdown

High Purity/Ultra-High Purity

Standard GF Series

High Flow GF Series

Ultra-Fast Response Time

Pressure Transient Insensitivity

 High Purity

Large installed base with proven long term performance
Flow Range (Full Scale Capacity)

3 sccm - 50,000 sccm

Standard GF Series: 3 sccm - 55 slm

High Flow GF Series: 55 slm - 300 slm

Standard GF Series: 3 sccm - 55 slpm

High Flow GF Series: 55 slpm - 300 slpm

 3 sccm - 55 slm 3 sccm - 30,000 sccm
Seal Material

Metal

 Metal Metal Metal Metal
Level of Purity / Surface Finish 5µ inch Ra avg

5 - 10µ inch Ra

 5 or 10µ inch Ra 16µ inch Ra

316L VAR, 316L, and high alloy ferritic stainless steel
Accuracy

Zero Leak Valve

<±1% S.P. (5-100% F.S.)

<±0.05% F. S. (0.5-5% F.S.)


Metal Seal Valve

<±1% S.P. (5-100% F.S.)

<±0.05% F. S. (2-5% F.S.)

Standard GF Series: ±1% S.P. > 20-100%; ±0.2% F.S. 2-20%

High Flow GF Series: ±1% S.P. > 35-100%; ±0.35% F.S. 2-35%

±1% S.P. > 35-100%

±0.35% F.S. 2-35%

±1% S.P. 35-100%

±0.35% F.S. < 5-35%

1% F.S. incl. linearity

1.5% F.S. incl. linearity >20 slpm
Repeatability < ±0.15% S.P. < ±0.15% S.P. < ±0.15% S.P. < ±0.2% S.P.

0.2% of rate
Response Time

280 ± 20 ms Matched Transient Response, for any ascending or descending non-zero setpoint

Normally Closed Valve: 300 ms - < 1 sec

SDS Gas Delivery: < 3 sec

High-Temperature Model: < 1 sec

Normally Closed Valve:

300 ms - < 700 ms

700 ms - < 1 sec

SDS Gas Delivery: < 3 sec

High-Temperature Model: < 1 sec

Normally Closed Valve: <1 sec

Normally Closed Valve: <3 sec

Optional: 600 msec
Pressure Transient Insensitivity

<± 1% S.P. up to 40 psi/sec inlet pressure spike

Specific models

<5% S.P. for up to 5 psi/sec upstream press. spike

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Multi-Gas & Range Configurability MultiFlo™ Standard MultiFlo™ Standard (most models) MultiFlo™ Standard (most models) MultiFlo™ Available

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Diagnostic Capability Available

Available

Available

Available

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Analog Communication

0-5 Vdc

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0-5 Vdc

0-20 mA

4-20 mA

0-5 Vdc

0-10 Vdc

4-20 mA

0-5 Vdc
Digital Communication

DeviceNet™

EtherCAT®

RS-485 L-Protocol

EtherCAT®

DeviceNet™

RS485 L-Protocol

DeviceNet™ 

Profibus®

RS485 S-Protocol

RS485 L-Protocol

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